Laser focussing module

US12007693B2 · kind B2 · utility

Assignees

• ASML NETHERLANDS B.V. · NL
• TRUMPF Lasersystems for Semiconductor Manufacturing GmbH · DE

Inventors

• Ruud Antonius Catharina Maria Beerens · Roggel, NL
• Nico Johannes Antonius Hubertus Boonen · Geldrop, NL
• Stefan Michael Bruno Bäumer · Eindhoven, NL
• Tolga Ergin · Bietigheim-Bissingen, DE
• Andreas Hopf · Stuttgart, DE
• Derk Jan Wilfred Klunder · Eindhoven, NL
• Martin Lambert · Korb, DE
• Stefan Piehler · Stuttgart, DE
• Manisha Ranjan · Eindhoven, NL
• Frank Bernhard Sperling · Eindhoven, NL
• Andrey Sergeevich TYCHKOV · Veldhoven, NL
• Jasper Witte · Eindhoven, NL
• Jiayue Yuan · Eindhoven, NL

Key dates

• Filing date: Apr 3, 2020
• Grant date: Jun 11, 2024
• Expiry date: Oct 21, 2040

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01S3/005
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A laser focusing system (330) for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror (330.1) configured to receive a laser beam from a beam delivery system (320) and generate a first reflected laser beam (316); •—a second curved mirror (330.2) configured to receive the first reflected laser beam (316) and generate a second reflected laser beam (317), wherein the laser focusing system (330) is configured to focus the second reflected laser beam (317) to a target location (340) in a vessel (350) of the EUV radiation source (360).