Active temperature control for RF window in immersed antenna source
US12014898B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2021 |
| Grant date | Jun 18, 2024 |
| Priority date | — |
| Expiry date | May 21, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A processing system including an ion source having a plasma chamber to house a plasma, an extraction assembly, disposed along a side of the plasma chamber, and including at least one extraction aperture, and an antenna assembly extending through the plasma chamber. The antenna assembly may include a dielectric enclosure and a plurality of conductive antennas extending through the dielectric enclosure, the conductive antennas having respective gas ports formed therein for delivering a gas into the dielectric enclosure. The processing system may further include a temperature regulation system coupled to the conductive antennas and to the dielectric enclosure for monitoring a temperature of the dielectric enclosure and regulating the gas delivered to the conductive antennas for regulating the temperature of the dielectric enclosure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.