Patent · US Active

Method for fabricating molds for lithography by nano-imprinting

US12022751B2 · kind B2 · utility

0Cited by
6References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 19, 2021
Grant dateJun 25, 2024
Priority date—
Expiry dateAug 22, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10N70/841
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

This method comprises the steps:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.