Steam treatment stations for chemical mechanical polishing system
US12030093B2 · kind B2 · utility
0Cited by
57References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 16, 2022 |
| Grant date | Jul 9, 2024 |
| Priority date | — |
| Expiry date | Aug 16, 2042 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B2230/01
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for steam treatment of a conditioner head and/or conditioner disk in a chemical mechanical polishing system includes a conditioner cleaning cup, a boiler to generate steam, one or more nozzles positioned to direct steam inwardly into a cavity defined by the load cup, and a supply line running from the boiler to the one or more nozzles to supply steam to the one or more nozzles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.