Hui Chen
24Patents
5h-index
44Co-inventors
69Inventor score
Filing activity: Feb 17, 2000 → Oct 27, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6905968B2 | Process for selectively etching dielectric layers | Electricity | 15 | Expired |
| US6569775B1 | Method for enhancing plasma processing performance | Electricity | 11 | Expired |
| US8844546B2 | Apparatus and method for cleaning semiconductor substrate using pressurized fluid | Electricity | 9 | Active |
| US7377002B2 | Scrubber box | Performing Operations; Transporting | 7 | Expired |
| US8968055B2 | Methods and apparatus for pre-chemical mechanical planarization buffing module | Performing Operations; Transporting | 6 | Active |
| US11446711B2 | Steam treatment stations for chemical mechanical polishing system | Performing Operations; Transporting | 5 | Active |
| US7636996B2 | Seal installation tool | Emerging Cross-Sectional Technologies | 2 | Active |
| US8101934B2 | Methods and apparatus for detecting a substrate notch or flat | Physics | 2 | Active |
| US10229842B2 | Double sided buff module for post CMP cleaning | Electricity | 1 | Active |
| US11633833B2 | Use of steam for pre-heating of CMP components | Performing Operations; Transporting | 1 | Active |
| US7774887B2 | Scrubber box and methods for using the same | Performing Operations; Transporting | 1 | Active |
| US11577358B2 | Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing | Performing Operations; Transporting | 1 | Active |
| US7962990B2 | Brush box cleaner module with force control | Electricity | 1 | Active |
| US11919123B2 | Apparatus and method for CMP temperature control | Performing Operations; Transporting | 0 | Active |
| US9119461B2 | High stiffness, anti-slip scrubber brush assembly, high-stiffness mandrel, subassemblies, and assembly methods | Electricity | 0 | Active |
| US10256120B2 | Systems, methods and apparatus for post-chemical mechanical planarization substrate buff pre-cleaning | Performing Operations; Transporting | 0 | Active |
| US11628478B2 | Steam cleaning of CMP components | Electricity | 0 | Active |
| US9873179B2 | Carrier for small pad for chemical mechanical polishing | Performing Operations; Transporting | 0 | Active |
| US12243761B2 | Detection and analysis of substrate support and pre-heat ring in a process chamber via imaging | Electricity | 0 | Active |
| US11865671B2 | Temperature-based in-situ edge assymetry correction during CMP | Electricity | 0 | Active |
| US12030093B2 | Steam treatment stations for chemical mechanical polishing system | Performing Operations; Transporting | 0 | Active |
| US11697187B2 | Temperature-based assymetry correction during CMP and nozzle for media dispensing | Electricity | 0 | Active |
| US8181302B2 | Brush alignment control mechanism | Human Necessities | 0 | Active |
| US12296427B2 | Apparatus and method for CMP temperature control | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.