High refractive index imprint compositions and materials and processes for making the same

US12044963B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Amita JOSHI · Fremont, US
• Ian McMackin · Austin, US
• Rami Hourani · Santa Clara, US
• Yingdong Luo · Newark, US
• Sivapackia Ganapathiappan · Palo Alto, US
• Ludovic Godet · Sunnyvale, US

Key dates

• Filing date: Jul 28, 2020
• Grant date: Jul 23, 2024
• Expiry date: Jul 29, 2041

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C01P2004/64
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition contains one or more types of nanoparticles, one or more surface ligands, one or more solvents, one or more additives, and one or more acrylates.