Optimization-based image processing for metrology
US12050408B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Nov 24, 2020 |
| Grant date | Jul 30, 2024 |
| Priority date | — |
| Expiry date | Mar 21, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
One or more images of a device feature are acquired using an imaging tool. A geometrical shape is defined encompassing the relevant pixels of each image, where the geometrical shape is represented in terms of one or more parameters. A cost function is defined whose variables comprise the one or more parameters of the geometrical shape. For each image, numerical optimization is applied to obtain optimal values of the one or more parameters for which the cost function is minimized. The optimal values of the one or more parameters are reported as metrology data pertaining to the device feature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.