Fluorine based molecular co-gas when running dimethylaluminum chloride as a source material to generate an aluminum ion beam
US12051561B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 30, 2023 |
| Grant date | Jul 30, 2024 |
| Priority date | — |
| Expiry date | Jun 30, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/05
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion implantation system, ion source, and method are provided having a gaseous aluminum-based ion source material. The gaseous aluminum-based ion source material can be, or include, dimethylaluminum chloride (DMAC), where the DMAC is a liquid that transitions into vapor phase at room temperature. An ion source receives and ionizes the gaseous aluminum-based ion source material to form an ion beam. A low-pressure gas bottle supplies the DMAC as a gas to an arc chamber of the ion source by a primary gas line. A separate, secondary gas line supplies a co-gas, such as a fluorine-containing molecule, to the ion source, where the co-gas and DMAC reduce an energetic carbon cross-contamination and/or increase doubly charged aluminum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.