Mask processing apparatus and substrate processing apparatus
US12055857B2 · kind B2 · utility
0Cited by
6References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2022 |
| Grant date | Aug 6, 2024 |
| Priority date | — |
| Expiry date | Dec 28, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70025
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The inventive concept provides a mask treatment apparatus. The mask treatment may include a support unit that supports the mask, and a light irradiation unit that irradiate the mask with a light to adjust a critical dimension of a pattern formed in the mask, wherein the light irradiation unit includes a light source that generates the light, and a light modulation element that modulates the light generated by the light source and forms an irradiation pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.