Feedback loop for controlling a pulsed voltage waveform
US12057292B2 · kind B2 · utility
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433References
20Claims
0Family size
Assignee
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Key dates
| Filing date | May 24, 2023 |
| Grant date | Aug 6, 2024 |
| Priority date | — |
| Expiry date | May 24, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6831
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.