Inventor · San Jose, CA, US

Leonid Dorf

54Patents
13h-index
53Co-inventors
83Inventor score

Filing activity: Nov 20, 2009 → Oct 2, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US10373804B2 System for tunable workpiece biasing in a plasma reactor Electricity 74 Active
US10555412B2 Method of controlling ion energy distribution using a pulse generator with a current-return output stage Electricity 55 Active
US10448494B1 Method of controlling ion energy distribution using a pulse generator with a current-return output stage Electricity 53 Active
US10791617B2 Method of controlling ion energy distribution using a pulse generator with a current-return output stage Electricity 51 Active
US10916408B2 Apparatus and method of forming plasma using a pulsed waveform Electricity 47 Active
US10448495B1 Method of controlling ion energy distribution using a pulse generator with a current-return output stage Electricity 45 Active
US10923321B2 Apparatus and method of generating a pulsed waveform Electricity 45 Active
US10312048B2 Creating ion energy distribution functions (IEDF) Electricity 39 Active
US9947517B1 Adjustable extended electrode for edge uniformity control Electricity 36 Active
US8313664B2 Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamber Electricity 35 Active
US10685807B2 Creating ion energy distribution functions (IEDF) Electricity 32 Active
US10103010B2 Adjustable extended electrode for edge uniformity control Electricity 32 Active
US10923320B2 System for tunable workpiece biasing in a plasma reactor Electricity 30 Active
US10553404B2 Adjustable extended electrode for edge uniformity control Electricity 13 Active
US10504702B2 Adjustable extended electrode for edge uniformity control Electricity 12 Active
US11284500B2 Method of controlling ion energy distribution using a pulse generator Electricity 12 Active
US10991556B2 Adjustable extended electrode for edge uniformity control Electricity 10 Active
US11476145B2 Automatic ESC bias compensation when using pulsed DC bias Electricity 6 Active
US8920597B2 Symmetric VHF source for a plasma reactor Electricity 6 Active
US9564297B2 Electron beam plasma source with remote radical source Electricity 6 Active
US9443700B2 Electron beam plasma source with segmented suppression electrode for uniform plasma generation Electricity 5 Active
US11699572B2 Feedback loop for controlling a pulsed voltage waveform Electricity 4 Active
US9111722B2 Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator Electricity 4 Active
US11462389B2 Pulsed-voltage hardware assembly for use in a plasma processing system Electricity 4 Active
US11069504B2 Creating ion energy distribution functions (IEDF) Electricity 3 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.