Patent · US Active

Method for fast loading substrates in a flat panel tool

US12061422B2 · kind B2 · utility

0Cited by
6References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 25, 2021
Grant dateAug 13, 2024
Priority date
Expiry dateApr 16, 2041

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02F1/1303
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.