Atomic layer deposition part coating chamber

US12074010B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Michael R. Rice · Pleasanton, US
• Hanish Kumar Panavalappil Kumarankutty · Bengaluru, IN
• Steven Marcus · Tempe, US
• Kirubanandan Naina SHANMUGAM · Kanchinakote, IN
• Sriharsha DHARMAPURA SATHYANARAYANAMURTHY · Bengaluru, IN
• Madhukar KRISHNA · Bengaluru, IN
• Shivaprakash Padadayya HIREMATH · Kanchinakote, IN
• Senthil Kumar Nattamai Subramanian · Hosur, IN
• Sankar Menon CHERUBALA PATHAYAPURA · Kanchinakote, IN

Key dates

• Filing date: Sep 9, 2021
• Grant date: Aug 27, 2024
• Expiry date: Sep 9, 2041

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/4582
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Methods and apparatus for coating processing reactor component parts are provided herein. In some embodiments, a part coating reactor includes: a lower body and a lid assembly that together define and enclose an interior volume; one or more heaters disposed in the lid assembly; one or more coolant channels disposed in the lid assembly to flow a heat transfer medium therethrough; a plurality of gas passages disposed through the lid assembly to facilitate providing one or more gases to the interior volume, wherein the plurality of gas passages include a plurality of fluidly independent plenums disposed in the lid assembly; and one or more mounting brackets to facilitate coupling a workpiece to the lid assembly.