Doped amorphous optical device films and deposition via incorporation of dopant atoms

US12077860B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Andrew CEBALLOS · Santa Clara, US
• Ludovic Godet · Sunnyvale, US
• Karl J. Armstrong · Sunnyvale, US
• Rami Hourani · Santa Clara, US

Key dates

• Filing date: Jul 2, 2021
• Grant date: Sep 3, 2024
• Expiry date: Nov 27, 2042

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B1/10
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Embodiments of the present disclosure generally relate to methods and materials for optical device fabrication. More specifically, embodiments described herein provide for optical film deposition methods and materials to expand the process window for amorphous optical film deposition via incorporation of dopant atoms by suppressing the crystal growth of optical materials during deposition. By enabling amorphous films to be deposited at higher temperatures, significant cost savings and increased throughput are possible.