Substrate processing system including coil with RF powered faraday shield
US12087557B2 · kind B2 · utility
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4References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 10, 2020 |
| Grant date | Sep 10, 2024 |
| Priority date | — |
| Expiry date | Jan 29, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N30/082
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A substrate processing system includes a processing chamber including a dielectric window and a substrate support arranged therein to support a substrate. A coil is arranged outside of the processing chamber adjacent to the dielectric window. A Faraday shield is arranged between the coil and the dielectric window. An RF generator is configured to supply RF power to the coil. The coil is coupled by stray capacitance and/or directly coupled to the Faraday shield. A capacitor is connected to one of the coil and the Faraday shield to adjust a position of a voltage standing wave along the coil.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.