Patent · US Active

Semiconductor devices and methods of manufacturing semiconductor devices

US12087760B2 · kind B2 · utility

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20Claims
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Key dates

Filing dateMay 6, 2022
Grant dateSep 10, 2024
Priority date
Expiry dateDec 24, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D84/859

Abstract

In an example, a semiconductor device includes a semiconductor substrate of a first conductivity type and a semiconductor region of the first conductivity type over the semiconductor substrate. A well region of a second conductivity type is in the semiconductor region. A doped region of the first conductivity type is in the well region. A doped region of the second conductivity type is in the well region. A doped region of the second conductivity type is in the semiconductor substrate at a bottom side. A doped region of the first conductivity type is in the semiconductor substrate at the bottom side. A first conductor is at a top side of the semiconductor region and a second conductor is at the bottom side. In some examples, one or more of doped regions at the bottom side is a patterned doped region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.