Patent · US Active

Surface roughness and emissivity determination

US12098914B2 · kind B2 · utility

0Cited by

3References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Eric Ng · Mountain View, US
Todd Egan · Fremont, US
Mehdi Vaez-Iravani · Los Gatos, US

Key dates

Filing date	Sep 29, 2022
Grant date	Sep 24, 2024
Priority date	—
Expiry date	Sep 29, 2042

Classification

Technology area (CPC G)Physics
CPC primaryG01N2201/1296
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A system includes a radiation source configured to emit a radiation beam. The system further includes a first optical sensor configured to detect a first intensity of a first portion of the radiation beam reflected from a surface of an object. The system further includes a second optical sensor configured to detect a second intensity of a second portion of the radiation beam scattered by the surface of the object. The system further includes a processing device communicatively coupled to the first optical sensor and the second optical sensor. The processing device is configured to determine at least one of a roughness or an emissivity of the surface of the object based on a comparison of the first intensity and the second intensity.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.