Steam-assisted single substrate cleaning process and apparatus
US12106976B2 · kind B2 · utility
0Cited by
24References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 23, 2023 |
| Grant date | Oct 1, 2024 |
| Priority date | — |
| Expiry date | Jun 23, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67109
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present disclosure relates to a method and apparatus for cleaning a substrate. The method includes rotating a substrate disposed on a substrate support and spraying a front side of the substrate using steam through a front side nozzle assembly. A back side of the substrate is sprayed using steam through a back side dispenser assembly. A heated chemical is dispensed over the front side of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.