Optical device having structural and refractive index gradation, and method of fabricating the same
US12109641B2 · kind B2 · utility
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5References
25Claims
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Key dates
| Filing date | Nov 17, 2021 |
| Grant date | Oct 8, 2024 |
| Priority date | — |
| Expiry date | Jan 24, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/0065
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present disclosure generally relates to a method and apparatus for forming a substrate having a graduated refractive index. A method of forming a waveguide structure includes expelling plasma from an applicator having a head toward a plurality of grating structures formed on a substrate. The plasma is formed in the head at atmospheric pressure. The method further includes changing a depth of the plurality of grating structures with the plasma by removing grating material from the plurality of grating structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.