Coater with automatic cleaning function and coater automatic cleaning method

US12111575B2 · kind B2 · utility

Assignee

• ACM RESEARCH (SHANGHAI), INC. · CN

Inventors

• Hui Wang · Shanghai, CN
• Fuping Chen · Shanghai, CN
• Wenjun Wang · Nagaokakyo, JP
• Hongchao Yang · Shanghai, CN
• Voha Nuch · Shanghai, CN
• Fufa Chen · Cupertino, US
• Jian Wang · Rosharon, US
• Xiaoyan Zhang · Shanghai, CN
• Shu Yang · Nantou, TW

Key dates

• Filing date: Oct 26, 2020
• Grant date: Oct 8, 2024
• Expiry date: Oct 26, 2040

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/68742
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A coater with automatic cleaning function and a coater automatic cleaning method. The coater (100,200,300,400,500,600,700,800) includes a coater chamber (101,201,301,401,501,601,701,801) capable of being filled up with cleaning solution, a substrate chuck (102,202,302,402,502,602,702,802) holding and positioning a substrate (103,203,303,403,503,603,703,803), and at least one shroud (108,208,308,408,508) capable of moving up for preventing photoresist from splashing out of the coater chamber (101,201,301,401,501,601,701,801), or moving down and immersing into the cleaning solution for cleaning. The coater (100,200,300,400,500,600,700,800) automatic cleaning method includes the following steps: turning off a liquid outlet valve (118,218,318,418A,418B,518,532,618,718,818) of the coater (100,200,300,400,500,600,700,800); filling up a coater chamber (101,201,301,401,501,601,701,801) with cleaning solution; after photoresist in the coater chamber (101,201,301,401,501,601,701,801) being dissolved into the cleaning solution, turning on the liquid outlet valve (118,218,318,418A,418B,518,532,618,718,818) and draining the cleaning solution out of the coater chamber (101,201,301,401,501,601,70…