Fufa Chen
27Patents
7h-index
38Co-inventors
69Inventor score
Filing activity: Jul 11, 1997 → Mar 9, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6364949B1 | 300 mm CVD chamber design for metal-organic thin film deposition | Chemistry; Metallurgy | 317 | Expired |
| US6220091A | Liquid level pressure sensor and method | Chemistry; Metallurgy | 26 | Expired |
| US6660135B2 | Staged aluminum deposition process for filling vias | Electricity | 16 | Expired |
| US6352620B2 | Staged aluminum deposition process for filling vias | Electricity | 15 | Expired |
| US6179277A | Liquid vaporizer systems and methods for their use | Chemistry; Metallurgy | 14 | Expired |
| US6436820B1 | Method for the CVD deposition of a low residual halogen content multi-layered titanium nitride film having a combined thickness greater than 1000 å | Chemistry; Metallurgy | 14 | Expired |
| US6086676A | Programmable electrical interlock system for a vacuum processing system | Chemistry; Metallurgy | 8 | Expired |
| US6221174A | Method of performing titanium/titanium nitride integration | Electricity | 6 | Expired |
| US6332601A | Liquid vaporizers for semiconductor processing systems | Chemistry; Metallurgy | 3 | Expired |
| US8580042B2 | Methods and apparatus for cleaning semiconductor wafers | Electricity | 2 | Active |
| US11141762B2 | System for cleaning semiconductor wafers | Physics | 2 | Active |
| US11581205B2 | Methods and system for cleaning semiconductor wafers | Electricity | 1 | Active |
| US10910244B2 | Methods and system for cleaning semiconductor wafers | Electricity | 1 | Active |
| US11257667B2 | Methods and apparatus for cleaning semiconductor wafers | Electricity | 1 | Active |
| US8671961B2 | Methods and apparatus for cleaning semiconductor wafers | Electricity | 1 | Active |
| US11037804B2 | Methods and apparatus for cleaning substrates | Emerging Cross-Sectional Technologies | 1 | Active |
| US11638937B2 | Methods and apparatus for cleaning substrates | Performing Operations; Transporting | 0 | Active |
| US11911807B2 | Method and apparatus for cleaning substrates | Performing Operations; Transporting | 0 | Active |
| US10816901B2 | Coater with automatic cleaning function and coater automatic cleaning method | Electricity | 0 | Active |
| US10770335B2 | Substrate supporting apparatus | Electricity | 0 | Active |
| US11752529B2 | Method for cleaning semiconductor wafers | Physics | 0 | Active |
| US12111575B2 | Coater with automatic cleaning function and coater automatic cleaning method | Electricity | 0 | Active |
| US11633765B2 | System for cleaning semiconductor wafers | Physics | 0 | Active |
| US11967497B2 | Methods and apparatus for cleaning semiconductor wafers | Electricity | 0 | Active |
| US11103898B2 | Methods and apparatus for cleaning substrates | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.