Method of forming topology-controlled amorphous carbon polymer film
US12112940B2 · kind B2 · utility
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2,213References
18Claims
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Key dates
| Filing date | Jul 15, 2020 |
| Grant date | Oct 8, 2024 |
| Priority date | — |
| Expiry date | Jul 15, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76224
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In exemplary embodiment, a method of top-selective deposition using a flowable carbon-based film on a substrate having a recess defined by a top surface, sidewall, and a bottom, includes steps of: (i) depositing a flowable carbon-based film in the recess of the substrate in a reaction space until a thickness of the flowable carbon-based film in the recess reaches a predetermined thickness, and then stopping the deposition step; and (ii) exposing the carbon-based film to a nitrogen plasma in an atmosphere substantially devoid of hydrogen and oxygen so as to redeposit a carbon-based film selectively on the top surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.