Ultrapure water supply apparatus, substrate processing system including the same, and substrate processing method using the same
US12122702B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 9, 2023 |
| Grant date | Oct 22, 2024 |
| Priority date | — |
| Expiry date | Feb 1, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67092
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Ultrapure water supply apparatuses, substrate processing systems, and substrate processing methods are provided. An ultrapure water supply apparatus includes: a first supply device that produces first ultrapure water; a second supply device that produces second ultrapure water; a first reserved supply device that provides the second supply device with a portion of fluid in the first supply device; and a second reserved supply device that provides the first supply device with a portion of fluid in the second supply device. The first supply device includes a first front-side filtering part, a first rear-side filtering part, and a first connection part. The second supply device includes a second front-side filtering part, a second rear-side filtering part, and a second connection part. Each of the first and second reserved supply devices connects the first connection part and the second connection part to each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.