Substrate treating apparatus with exhaust airflow guide
US12140868B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 20, 2022 |
| Grant date | Nov 12, 2024 |
| Priority date | — |
| Expiry date | Jun 16, 2042 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05C11/1039
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes substrate treating apparatus comprising: a treating container having an inner space; a support unit configured to support and rotate a substrate within the inner space; an exhaust duct configured to exhaust the inner space; and at least one guide member combined with the treating container and configured to guide an airflow within the inner space, and wherein the at least one guide member is arranged such that the airflow within the inner space obliquely flows with respect to a rotation direction of the substrate supported by the support unit when seen from above.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.