Method and apparatus for plasma generation
US12159765B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 2, 2022 |
| Grant date | Dec 3, 2024 |
| Priority date | — |
| Expiry date | Jul 1, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32568
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma source is provided that is configured to form a section of a wall of a vacuum component. The plasma source comprises a body including a dielectric member, a first surface exposed to an exterior region of the vacuum component, and a second surface exposed to an interior region of the vacuum component. The plasma source also comprises at least one electrode disposed in a receiving channel of the body with at least a portion of the dielectric member located adjacent to the at least one electrode in the receiving channel. The plasma source further comprise at least one discharge region adjacent to the receiving channel within the body. The at least one discharge region is exposed to the interior region of the vacuum component via an opening on the second surface of the body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.