Method and system of image-forming multi-electron beams
US12165831B2 · kind B2 · utility
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22Claims
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Key dates
| Filing date | May 31, 2022 |
| Grant date | Dec 10, 2024 |
| Priority date | — |
| Expiry date | Jun 3, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2811
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separate the secondary electron beams from the primary electron beams and can correct the astigmatism and source energy dispersion blurs for all the beamlets simultaneously.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.