Bipolar electrostatic chuck for etch chamber
US12165899B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 7, 2022 |
| Grant date | Dec 10, 2024 |
| Priority date | — |
| Expiry date | Jun 8, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67109
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Embodiments of bipolar electrostatic chucks are provided herein. In some embodiments, a bipolar electrostatic chuck includes a ceramic plate; a plurality of electrodes disposed in the ceramic plate, wherein the plurality of electrodes include one or more positive electrodes arranged in a first pattern and one or more negative electrodes arranged in a second pattern; an aluminum base plate coupled to the ceramic plate; a positive conduit extending through the aluminum base plate and electrically coupled to the one or more positive electrodes, and a negative conduit extending through the aluminum base plate and electrically coupled to the one or more negative electrodes; and a first insulative tube disposed about each of the positive conduit and the negative conduit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.