Pellicle for an EUV lithography mask and a method of manufacturing thereof
US12174526B2 · kind B2 · utility
1Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 14, 2022 |
| Grant date | Dec 24, 2024 |
| Priority date | — |
| Expiry date | Mar 22, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/64
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pellicle for an EUV photo mask includes a first layer, a second layer, and a main membrane disposed between the first layer and second layer. The main membrane includes a plurality of co-axial nanotubes, each of which includes an inner tube and one or more outer tubes surrounding the inner tube, and two of the inner tube and one or more outer tubes are made of different materials from each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.