Patent · US Active

Electrochemical deposition system including optical probes

US12180607B2 · kind B2 · utility

0Cited by
2References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 19, 2020
Grant dateDec 31, 2024
Priority date
Expiry dateMay 27, 2041

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B11/0683
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

An electrochemical deposition system includes: an electrochemical deposition chamber including an electrolyte for electrochemical deposition; a substrate holder configured to hold a substrate and including a first cathode that is electrically connected to the substrate; a first actuator configured to adjust a vertical position of the substrate holder within the electrochemical deposition chamber; an anode submerged in the electrolyte; a second cathode arranged between the first cathode and the anode; a first optical probe configured to measure a first reflectivity of the substrate at a first distance from a center of the substrate while the substrate is submerged within the electrolyte during the electrochemical deposition; and a controller configured to, based on the first reflectivity, selectively adjust at least one of power applied to the first cathode, power applied to the second cathode, power applied to the anode, and the vertical position of the substrate holder.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.