Manish Ranjan
20Patents
5h-index
64Co-inventors
68Inventor score
Filing activity: Oct 22, 2007 → Dec 24, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9028666B2 | Wetting wave front control for reduced air entrapment during wafer entry into electroplating bath | Electricity | 13 | Active |
| US8301396B1 | Miniature ultrafine particle sensor | Performing Operations; Transporting | 7 | Active |
| US9587322B2 | Wetting wave front control for reduced air entrapment during wafer entry into electroplating bath | Electricity | 6 | Active |
| US8730448B2 | Lithographic apparatus and device manufacturing method | Physics | 6 | Active |
| US9735035B1 | Methods and apparatuses for estimating on-wafer oxide layer reduction effectiveness via color sensing | Electricity | 6 | Active |
| US8299446B2 | Sub-field enhanced global alignment | Electricity | 5 | Active |
| US10593586B2 | Systems and methods for controlling substrate approach toward a target horizontal plane | Electricity | 1 | Active |
| US10968531B2 | Wetting wave front control for reduced air entrapment during wafer entry into electroplating bath | Electricity | 1 | Active |
| US8797504B2 | Lithographic apparatus and device manufacturing method | Physics | 1 | Active |
| US10443146B2 | Monitoring surface oxide on seed layers during electroplating | Chemistry; Metallurgy | 1 | Active |
| US9625835B2 | Lithographic apparatus and device manufacturing method | Physics | 1 | Active |
| US10497592B2 | Methods and apparatuses for estimating on-wafer oxide layer reduction effectiveness via color sensing | Electricity | 1 | Active |
| US12332570B2 | Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris | Physics | 0 | Active |
| US11208732B2 | Monitoring surface oxide on seed layers during electroplating | Chemistry; Metallurgy | 0 | Active |
| US12105039B2 | Systems and methods for in-situ measurement of sheet resistance on substrates | Physics | 0 | Active |
| US11906907B2 | Apparatus and method for determining a condition associated with a pellicle | Physics | 0 | Active |
| US12158706B2 | Lithographic apparatus and method with improved contaminant particle capture | Physics | 0 | Active |
| US11621187B2 | Systems and methods for controlling substrate approach toward a target horizontal plane | Electricity | 0 | Active |
| US12180607B2 | Electrochemical deposition system including optical probes | Physics | 0 | Active |
| US9823590B2 | Lithographic apparatus and device manufacturing method | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.