Computational metrology
US12189302B2 · kind B2 · utility
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14References
22Claims
0Family size
Assignee
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Key dates
| Filing date | May 6, 2022 |
| Grant date | Jan 7, 2025 |
| Priority date | — |
| Expiry date | Jul 20, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2119/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.