Reticle gripper damper and isolation system for lithographic apparatuses

US12189312B2 · kind B2 · utility

Assignees

• ASML Holding N.V. · NL
• ASML NETHERLANDS B.V. · NL

Inventors

• Roberto B. Wiener · Bethel, US
• Peter Kochersperger · Easton, US
• Boris Kogan · Dallas, US
• Martinus Agnes Willem Cuijpers · Veldhoven, NL
• Robert Wade · Louisville, US
• Shaun Evans · Auckland, NZ

Key dates

• Filing date: Jan 26, 2021
• Grant date: Jan 7, 2025
• Expiry date: Aug 12, 2041

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/68707
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Embodiments herein describe methods, devices, and systems for a reticle gripper damper and isolation system for handling reticles and reducing vibrations in a reticle handler for lithography apparatuses and systems. A reticle handler apparatus includes a reticle handler arm, a reticle baseplate configured to hold the reticle, and a gripper arranged to connect the reticle baseplate to the reticle handler arm. The gripper includes a static structure that is coupled to the reticle handler arm, an isolation structure that is coupled to the static structure, and one or more damping elements. The gripper is configured to reduce vibrations of the reticle in the reticle handler apparatus using the one or more damping elements.