Metrology method and associated metrology and lithographic apparatuses
US12189314B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 4, 2021 |
| Grant date | Jan 7, 2025 |
| Priority date | — |
| Expiry date | Dec 26, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706837
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for a metrology process, the method includes obtaining first measurement data relating to a first set of measurement conditions and determining a first measurement recipe based on the first measurement data. At least one performance indicator is determined from one or more components of the first measurement data obtained from a component analysis or statistical decomposition. Alternatively, at least one performance indicator is determined from a comparison of one or more first measurement values relating to the first measurement recipe and one or more second measurement values relating to a second measurement recipe, where second measurement recipe is different to the first measurement data and relates a second set of measurement conditions, the second set of measurement conditions being different to the first set of measurement conditions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.