Patent · US Active

Electrochemical deposition systems with enhanced crystallization prevention features

US12195867B2 · kind B2 · utility

0Cited by
1References
7Claims
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Assignee

Inventors

Key dates

Filing dateNov 30, 2021
Grant dateJan 14, 2025
Priority date
Expiry dateNov 30, 2041

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25D21/02
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Electrochemical deposition systems and methods are described that have enhanced crystallization prevention features. The systems may include a bath vessel operable to hold an electrochemical deposition fluid having a metal salt dissolved in water. The systems may also include sensors including a thermometer and concentration sensor operable to measure characteristics of the electrochemical deposition fluid. The systems further include a computer configured to perform operations that include receiving system data from the electrochemical system and generating a control signal to change a characteristic of the electrochemical deposition fluid to prevent crystallization of a metal salt in the fluid. The computer generates the control signal based on processing that may include comparing an actual metal salt concentration in the electrochemical deposition fluid to a theoretical solubility limit for the metal salt in the fluid.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.