Training methods for machine learning assisted optical proximity error
US12204250B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Aug 14, 2023 |
| Grant date | Jan 21, 2025 |
| Priority date | — |
| Expiry date | Aug 14, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06N20/20
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method including: obtaining data based an optical proximity correction for a spatially shifted version of a training design pattern; and training a machine learning model configured to predict optical proximity corrections for design patterns using data regarding the training design pattern and the data based on the optical proximity correction for the spatially shifted version of the training design pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.