Patterning of optical device films via inkjet soluble mask, deposition, and lift-off
US12208637B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 10, 2023 |
| Grant date | Jan 28, 2025 |
| Priority date | — |
| Expiry date | Jul 23, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/0172
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Embodiments of the present disclosure generally relate to optical devices. More specifically, embodiments described herein relate to optical devices and methods of manufacturing a patterned optical device film on an optical device substrate. According to certain embodiments, an inkjet deposition process is used to deposit a patterned inkjet coating layer on the optical device substrate. A deposition process may then be used to deposit an optical device material on the patterned inkjet coating and the optical device substrate. The patterned inkjet coating on the optical device substrate may then be washed with an appropriate detergent to lift-off the patterned inkjet coating layer from the optical device substrate to form the patterned optical device film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.