Systems and methods for thermally conditioning a wafer in a charged particle beam apparatus
US12217930B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2023 |
| Grant date | Feb 4, 2025 |
| Priority date | — |
| Expiry date | Sep 14, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2814
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.