Apparatus for treating substrate
US12228861B2 · kind B2 · utility
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8Claims
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Key dates
| Filing date | Nov 9, 2021 |
| Grant date | Feb 18, 2025 |
| Priority date | — |
| Expiry date | Aug 20, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for treating a substrate includes a treating vessel having an inner space, a support unit that supports and rotates the substrate in the inner space, and an exhaust unit that releases an air flow in the inner space. The exhaust unit includes an air-flow guide duct into which the air flow is introduced in a tangential direction with respect to a rotating direction of the substrate supported on the support unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.