Method for manufacturing a mould for nanoprinting and associated mould
US12233577B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 22, 2022 |
| Grant date | Feb 25, 2025 |
| Priority date | — |
| Expiry date | Sep 22, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31144
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method for manufacturing a mould for nanoprinting and the associated mould, includes providing a substrate having a layer, and at least one ion implantation configured so as to obtain in the layer, at least one first non-implanted portion or portion having a first implantation, at least one second portion having a second implantation, and a third non-implanted portion distinct from the first portion. After implantation, the method includes etching the layer configured so as to have a different etching speed between at least the second portion and the third portion, so as to etch through the openings of an etching mask, a plurality of patterns of different heights being included in the layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.