Group VI precursor compounds
US12258356B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2023 |
| Grant date | Mar 25, 2025 |
| Priority date | — |
| Expiry date | Sep 27, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/32051
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The invention provides a facile process for preparing various Group VI precursor compounds useful in the vapor deposition of such Group VI metals onto solid substrates, especially microelectronic semiconductor device substrates. The process provides an effective means to obtain such volatile materials, which can then be sources of molybdenum, chromium, or tungsten-containing materials to be deposited on such substrates. Additionally, the invention provides a method for vapor deposition of such compounds onto microelectronic device substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.