System to inspect, modify or analyze a region of interest of a sample by charged particles, set of systems to inspect, modify or analyze a region of interest of a sample and method to inspect, modify or analyze a region of interest of a sample by charged particles
US12270774B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 2, 2024 |
| Grant date | Apr 8, 2025 |
| Priority date | — |
| Expiry date | May 2, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/30483
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system inspects, modifies or analyzes a region of interest of a sample via charged particles. A detector device of the system produces a pixel image having horizontal and vertical pixel resolutions. A charged particle deflection device produces a scanning charged particle beam in a scanning region. The deflection device has horizontal and vertical deflection units controlled by a digital to analog converter having a digital resolution larger than the horizontal pixel resolution and/or the vertical pixel resolution. An operator control interface of the system selects an assignment between respective image pixels of a desired pixel image and digital inputs of the DAC to produce horizontal and/or vertical deflection signals to guide the charged particle beam to the location of the respective image pixel. A reliable image of a sample can be obtained even when there is zooming or panning within an accessible region of the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.