Method and system for reticle enhancement technology
US12287567B2 · kind B2 · utility
0Cited by
2References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 30, 2024 |
| Grant date | Apr 29, 2025 |
| Priority date | — |
| Expiry date | Jan 30, 2044 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods incorporate variable side wall angle (VSA) into calculated patterns, using a mask 3D (M3D) effect. Embodiments include inputting a mask exposure information and determining the M3D effect. Determining the M3D effect may include determining the VSA. Embodiments may include calculating a VSA; and calculating a pattern on a substrate using the calculated VSA, wherein calculating the pattern on the substrate includes a mask 3D effect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.