Stage system, lithographic apparatus, method for positioning and device manufacturing method
US12287586B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2023 |
| Grant date | Apr 29, 2025 |
| Priority date | — |
| Expiry date | Dec 28, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67288
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.