Particle beam system
US12293896B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 17, 2020 |
| Grant date | May 6, 2025 |
| Priority date | — |
| Expiry date | Mar 6, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A particle beam system includes: a multi-beam particle source configured to generate a multiplicity of particle beams; an imaging optical unit configured to image an object plane in particle-optical fashion into an image plane and direct the multiplicity of particle beams on the image plane; and a field generating arrangement configured to generate electric and/or magnetic deflection fields of adjustable strength in regions close to the object plane. The particle beams are deflected in operation by the deflection fields through deflection angles that depend on the strength of the deflection fields.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.