Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle
US12298663B2 · kind B2 · utility
0Cited by
10References
20Claims
0Family size
Assignee
Inventors
- Mária Péter
- Erik Achilles Abegg
- Adrianus Johannes Maria Giesbers
- Johan Hendrik Klootwijk
- Maxim Aleksandrovich Nasalevich
- Wilhelmus Theodorus Anthonius Johannes Van Den Einden
- Willem Joan Van Der Zande
- Pieter-Jan Van Zwol
- Johannes Petrus Martinus Bernardus Vermeulen
- David Ferdinand Vles
- Willem-Pieter Voorthuijzen
Key dates
| Filing date | Oct 11, 2016 |
| Grant date | May 13, 2025 |
| Priority date | — |
| Expiry date | Oct 11, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/067
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods of manufacturing a pellicle for a lithographic apparatus including a method involving depositing at least one graphene layer on a planar surface of a substrate. The substrate has a first substrate portion and a second substrate portion. The method further includes removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.