Substrate processing apparatus
US12298676B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 23, 2023 |
| Grant date | May 13, 2025 |
| Priority date | — |
| Expiry date | Nov 10, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate processing apparatus includes a table in an exposure chamber that is configured to perform an exposure process on a semiconductor substrate, a guiding device including a first horizontal driving body slidably movable in a first horizontal direction and a guide rail on the first horizontal driving body and having a trench extending in a second horizontal direction, a positioning device connected to the guiding device, the positioning device including a slider, a second horizontal driving body and a substrate stage, the slider configured to slidably move in the second horizontal direction along the trench, the second horizontal driving body connected or fixed to the slider, the substrate stage on the second horizontal driving body and configured to support the semiconductor substrate, and a blocking member between the guide rail and the substrate stage to block an inflow of foreign substances onto the substrate stage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.