Substrate processing apparatus and substrate processing method having enhanced configuration of replenishing processing liquid
US12300518B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2022 |
| Grant date | May 13, 2025 |
| Priority date | — |
| Expiry date | Jun 2, 2043 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B2203/027
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus includes: a tank storing a processing liquid; a circulation line; a branch line; a processing part for supplying the processing liquid to a substrate at the branch line; a discharge part for reducing a storage amount of the processing liquid; a supply part for supplying a new processing liquid to the tank; and a controller including: a first determination part for determining whether the storage amount is less than a lower limit value; a first replenishment controller for replenishing the processing liquid to the tank when the storage amount is less than the lower limit value; a calculation part for calculating a replenishment amount of the processing liquid; and a second replenishment controller for reducing the storage amount and replenishing the processing liquid to the tank when a calculation value of the replenishment amount is less than a set value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.