Patent · US Active

Inspection system, lithographic apparatus, and inspection method

US12313980B2 · kind B2 · utility

0Cited by
3References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 25, 2019
Grant dateMay 27, 2025
Priority date
Expiry dateAug 13, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67288
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An inspection system that include a selective deposition tool configured to receive a sample and selectively deposit a material onto the sample, an inspection tool configured to perform an inspection process on the sample provided with the deposited material, and an enclosure configured to enclose the selective deposition tool and the inspection tool.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.