Method in the manufacturing process of a device, a non-transitory computer-readable medium and a system configured to perform the method
US12315175B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 23, 2019 |
| Grant date | May 27, 2025 |
| Priority date | — |
| Expiry date | Jun 20, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for determining an image-metric of features on a substrate, the method including: obtaining a first image of a plurality of features on a substrate; obtaining one or more further images of a corresponding plurality of features on the substrate, wherein at least one of the one or more further images is of a different layer of the substrate than the first image; generating aligned versions of the first and one or more further images by performing an alignment process on the first and one or more further images; and calculating an image-metric in dependence on a comparison of the features in the aligned version of the first image and the corresponding features in the one or more aligned versions of the one or more further images.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.