Substrate processing apparatus and method
US12325915B2 · kind B2 · utility
0Cited by
6References
12Claims
0Family size
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Key dates
| Filing date | Nov 25, 2020 |
| Grant date | Jun 10, 2025 |
| Priority date | — |
| Expiry date | Oct 24, 2041 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02C20/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate processing apparatus, including a reaction chamber to process a substrate, a photon source to provide the reaction chamber with photons from the top side of the reaction chamber, a substrate support to support the substrate, a chemical inlet to provide the reaction chamber with a reactive chemical; and a chemical outlet to exhaust gases from the reaction chamber, the chemical outlet including a surface separating the reaction chamber from a surrounding space.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.